[SEMICON JAPAN] Samsung Semiconductor Leads Collaborative Carbon Reduction with Alternative Gases

The G2 gas, jointly developed by Samsung Semiconductor and Daikin, was introduced at the SEMICON Japan 2025 event, which was held from December 17 to 19. Daikin, a semiconductor process gas manufacturer, presented its newly developed gases and process recipes during the three-day event, and the G2 gas—co‑developed with Samsung Semiconductor—was introduced to semiconductor industry stakeholders for the first time.

Samsung Semiconductor has established partnerships with its material and equipment suppliers, continuing collaborative efforts to develop alternative gases with lower Global Warming Potential (GWP) to further reduce Scope 1 emissions.
To maximize greenhouse gas (GHG) reduction, CF₄¹⁾, CHF₃²⁾ and C₄F₈³⁾—process gases that account for a significant portion of manufacturing emissions⁴⁾—have been selected as priority targets for development. Various candidates were evaluated and analyzed in collaboration with suppliers through a structured process, including material and equipment assessments, in-house laboratory testing, and mass production line validation.

The selected alternative gases are applied in the 'Etching' process of semiconductor manufacturing. The G1 gas that replaces C₄F₈ has been in use since 2018; the G3 gas that replaces CF₄ (with almost 100% GWP reduction) has been applied on‑site since 2025. Moreover, starting in 2026, Samsung Semiconductor will apply G2 gas, an alternative to CHF₃ with approximately 90% GWP reduction, to further reduce GHG emissions.

The developed alternative gases are not limited to internal use but will be open to the semiconductor industry, with the aim of reducing carbon emissions from semiconductor process gases. In addition, continuous technology development and collaboration with equipment suppliers are enabling efficiency upgrades to existing equipment and the development of low-power components for new facilities, further advancing efforts to reduce Scope 2 emissions.

Since announcing the New Environmental Strategy in 2022, which set a goal of achieving Net Zero (Scope 1 and 2) by 2050, Samsung Semiconductor has been working to minimize Scope 1 emissions from process gases and fuels such as LNG used in semiconductor manufacturing.
Process gases account for approximately 70 % of Samsung Semiconductor’s Scope 1 emissions. To reduce these emissions, Samsung Semiconductor has developed the first large‑scale integrated process‑gas treatment facility—RCS (Regenerative Catalytic System). In 2024, four additional RCS units were installed in one production line, bringing the total cumulative to 52 units currently operational. Furthermore, through the development and field application of third‑generation catalysts, the company has improved the efficiency for PFCs⁵⁾ up to 97 %.

Going forward, Samsung Semiconductor plans to continue expanding RCS installation to existing production lines⁶⁾ as well as new ones, and will continue investing in research to develop alternative gases applicable to its manufacturing sites.

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_{¹⁾ Carbon Tetrafluoride, IPCC AR6 GWP = 7,380
²⁾ Trifluoromethane, IPCC AR6 GWP = 11,700
³⁾ Octafluorocyclobutane, IPCC AR6 GWP = 10,200
⁴⁾ As of 2025
⁵⁾ Perfluoro compounds
⁶⁾ Excluding a few cases where installation is not feasible}