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[Card News] Surpassing the 5nm barrier: Samsung leadership in ultra-fine EUV-based foundry processes

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[Card News] Surpassing the 5nm barrier: Samsung leadership in ultra-fine EUV-based foundry processes Samsung’s addition of an EUV (Extreme Ultraviolet) line at its Hwaseong Campus last year signaled the start of a campaign to establish technological leadership in the latest ultra-fine semiconductor processes. Check out the card news about Samsung’s recent ultra-fine EUV photolithography foundry technology, from 7nm down to the recently developed 5nm processes.
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