Tanaka, Y.,Samsung Japan, Recent Advancements in Physical and Chemical MEMS Sensors. Analyst, 2024, 149, 3498–3512. ,2024, https://doi.org/10.1039/D4AN00182F

田中陽, 日本サムスン, ガラスマイクロ流体チップの概要と最新技術 -何度も着脱可能なガラス基板の接着法など-、ニューガラスフォーラム第2回ガラス技術研究会, 2023, https://www.newglass.jp/seminar/2024/02/08/509/

Shimada, T.*1; Yamasaki, H.*1; Kuroki, T.*1; Kang, J.*2; Kim, D.-W.*2; Yagi, T.*3; Okubo, M.*1, *1:Osaka Prefecutre Univ., 2:Samsung Electronics, 3:Samsung Japan, Wet-Type Packed-Bed Nonthermal Plasma for Simultaneous Removal of PM and VOCs. Plasma Chemistry and Plasma Processing, 2024, 44, 239–255. https://doi.org/10.1007/s11090-023-10403-1.

Yukika Yamada*1*2, Masaki Matsubara*1*3, Atsushi Muramatsu*1, Shin-ichi Takeda*4, Kiyoshi Kanie*1, 1:Tohoku Univ., 2:Samsung Japan, 3:Sendai College, 4:Takeda Coooid Tehno-Consulting, Highly Concentrated Solvothermal Synthesis of Sub-10-nm BaTiO3 Nanoparticles for Optical Applications,Advanced Powder Technology, 2022, https://doi.org/10.1016/j.apt.2022.103660

Haruhiko Yamasaki*1, Kohei Kishimoto*1, Takumi Shimada*1, Tomoyuki Kuroki*1, Jinkyu Kang*2, Dongwook Kim*2, Tadao Yagi*1, Masaaki Okubo*1,1:Osaka Metropolitan Univ., 2:Samsung Electronics, 3:Samsung Japan, Toward Ideal VOCs and Nanoparticle Emission Control Technology Using a Wet-Type Catalysis Nonthermal Plasma Reactor, 2021 IEEE Industry Applications Annual Meeting, 2022, https://doi.org/10.1109/TIA.2022.3188239

Wataru Sotoyama*1, 1:Samsung Japan, Simulation of Low-Lying Singlet and Triplet Excited States of Multiple-Resonance-Type Thermally Activated Delayed Fluorescence Emitters by Delta Self-Consistent Field (ΔSCF) Method, The Journal of Physical Chemistry A, 2021, https://doi.org/10.1021/acs.jpca.1c08900

Chul-Joon Heo*1, Takeo Motoyama*2, Gae Hwang Lee*1, Sungyoung Yun*1, Sungjun Park*1, Younhee Lim*1, Kiyohiko Tsutsumi*2, Yeonhee Kim*1, Yongyoung Park*1, Jaecheol Lee*1, Seon-jeong Lim*1, Yeoung Suk Choi*1, Takkyun Ro*1, Sunghan Kim*1, Yong Wan Jin*1, Kyung-Bae Park*1, 1:Samsung Electronics, 2:Samsung Japan, Highly Durable Organic Photodetector for Complementary Metal Oxide Semiconductor Image Sensors, Organic Electronics, 2021, https://doi.org/10.1016/j.orgel.2021.106154

Haruhiko Yamasaki*1, Kohei Kishimoto*1, Takumi Shimada*1, Tomoyuki Kuroki*1, Jinkyu Kang*2, Dongwook Kim*2, Tadao Yagi*3, Masaaki Okubo*1,1:Osaka Metropolitan Univ., 2:Samsung Electronics, 3:Samsung Japan, Toward Ideal VOCs and Nanoparticle Emission Control Technology Using a Wet-Type Catalysis Nonthermal Plasma Reactor, 2021 IEEE Industry Applications Annual Meeting, 2021, https://doi.org/10.1109/IAS48185.2021.9677125

大橋岬*1, 八木弾生*2, 大久保雅章*1, 金 東旭*3, 1:大阪公立大学, 2:日本サムスン, 3:Samsung Electronics,湿式プラズマリアクタによるVOC・PMの除去性能評価, 第31回環境工学総合シンポジウム2021, 2021, https://confit.atlas.jp/guide/event/env21/subject/13001-04-03/classlist

島田拓弥*1, 八木弾生*2, 大久保雅章*1, 姜 珍圭*3, 金 東旭*3, 1:大阪公立大学, 2:日本サムスン, 3:Samsung Electronics, 触媒充填層プラズマリアクタによるVOC・微粒子の除去性能評価, 第31回環境工学総合シンポジウム2021, 2021, https://confit.atlas.jp/guide/event/env21/subject/13001-04-02/detail?lang=ja

Takumi Shimada*1, Kohei Kishimoto*1, Haruhiko Yamasaki*1, Tomoyuki Kuroki*1, Jinkyu Kang*1, Dongwook Kim*2, Tadao Yagi*3, Masaaki Okubo*1,1:Osaka Metropolitan Univ., 2:Samsung Electronics, 3:Samsung Japan, Toward Ideal VOCs and Nanoparticle Emission Control Technology Using a Wet-Type Catalysis Nonthermal Plasma Reactor, EAPETEA-8, 2021, https://doi.org/10.1109/TIA.2022.3188239

Naotoshi Suganuma*1, Chul-Joon Heo*2, Daiki Minami*2, Sungyoung Yun*2, Sungjun Park*2, Younhee Lim*2, Feifei Fang*2, Byoungki Choi*2, Kyung-Bae Park*2, 1:Samsung Japan, 2:Samsung Electronics, High Speed Response Organic Photodetectors with Cascade Buffer Layers, Advanced Electronic Materials, 2021, https://doi.org/10.1002/aelm.202100539

Younhee Lim*1, Sungyoung Yun*1, Daiki Minami*1, Taejin Choi*1, Hyesung Choi*1, Jisoo Shin*1, Chul-Joon Heo*1, Dong-Seok Leem*1, Tadao Yagi*2, Kyung-Bae Park*1, Sunghan Kim*1, 1:Samsung Electronics, 2:Samsung Japan, Green-Light-Selective Organic Photodiodes with High Detectivity for CMOS Color Image Sensors, Applied Materials & Interfaces, 2020, https://doi.org/10.1021/acsami.0c14237

奚 訓*1, 野村 駿斗*1, 岸本 康平*1, 山崎 晴彦*1, 黒木 智之*1, 姜 珍圭*2, 八木 弾生*3, 大久保雅章*1,1:大阪公立大学, 2:Samsung Electronics, 3:日本サムスン, 湿式プラズマリアクタによるNOx・SOx・ナノ粒子の同時除去技術,環境工学総合シンポジウム, 2020, https://doi.org/10.1299/jsmeenv.2020.30.306

Haruko Yamasaki*1, Shunto Nomura*1, Xi Xun*1, Tomoyuki Kuroki*1, Jinkyu Kang*1, Tadao Yagi*2, Masaaki Okubo*1,1:Osaka Metroplitan Univ., 2:Samsung Japan, Toward NOx/SOx and nanoparticle control technology using a single-stage wet-type nonthermal plasma reactor, IEEE Transactions on Plasma Science, 2021, https://doi.org/10.1109/TPS.2021.3080681

Wentao Li*1, , Huy H.H.*1, S. Takahashi*2, Y. Hirayama*2, Y. Kato*2, Nam Hai Pham*1, 1.Tokyo Tech, 2.Samsung Japan, Growth and evaluation of highly textured BiSb(001) topological insulator on Si/SiOx, 第85回応用物理学会秋季学術講演会, https://meeting.jsap.or.jp/archive/jsap2024a/jsapm/wp-content/uploads/2024/07/2024a_final-program.pdf

HOANGHUY HO*1, WENTAO L.*1,TAKAHASHI S.*2, HIRAYAMA Y.*2, KATO Y.*2, NAMHAI PHAM*1, Spin Hall effect in annealed BiSb topological thin films deposited on Si/SiOx substrates, 第85回応用物理学会秋季学術講演会, https://meeting.jsap.or.jp/archive/jsap2024a/jsapm/wp-content/uploads/2024/07/2024a_final-program.pdf

H. Ho*1, R. Zhang*1, T. Shirokura*1,S. Takahashi*2, Y. Hirayama*2 and H.N. Pham*1, 1: Tokyo Institute of Technology, 2: Samsung Japan, Integration of BiSb topological insulator and CoFeB/MgO with perpendicular magnetic anisotropy using an oxide interfacial layer for ultralow power spin-orbit torque magnetic memory, IEEE International Magnetics Conference, 2023, https://doi.org/10.1109/TMAG.2023.3275171

Y. Fujita*1, D. Oshima*1, S. Takahashi*3, Y. Hirayama*3 and T. Kato*1,2, 1:Nagoya University, 2:Nagoya University, 3:Samsung Japan, Magnetization property Inspection method for MRAM manufacturing, IEEE international Magnetics Conference INTERMAG 2023, 2023, https://confcats-siteplex.s3.us-east-1.amazonaws.com/intermag23/Intermag_2023_Digest_Book_47fc192d97.pdf?updated_at=2023-05-14T07:35:51.300Z

Huy, H. H.*1; Ruixian, Z.*1; Shirokura, T.*1; Takahashi, S.*2; Hirayama, Y.*2; Hai, P. N.*1,1: Tokyo Institute of Technology, 2: Samsung Japan, Integration of BiSb Topological Insulator and CoFeB/MgO With Perpendicular Magnetic Anisotropy Using an Oxide Interfacial Layer for Ultralow Power SOT-MRAM Cache Memory. IEEE transactions on magnetics, 2023, 59, 1–5. https://doi.org/10.1109/TMAG.2023.3275171

Y.Fujita*1, D.Oshima*1, S.Takahashi*2,Y.Hirayama*2,T.Kato*1,1:Nagoya Univ., 2:Samsung JapanSpin Orbit Torque Magnetization Switching of Tb/Gd/FeCo Multilayers deposited on Ta layerThe 47th Annual Conference on MAGNETICS in Japan, 2023, https://www.magnetics.jp/kouenkai/2023/session/common/doc/program1_program_en.pdf

H. HO*1, R. Zhang*1, T. Shirokura*1, S. Takahashi*2, Y. Hirayama*2, Nam Hai Pham*1, 1:Tokyo Institute of Technology, 2.Samsung Japan, Integration of BiSb topological insulator and perpendicularly magnetized CoFeB/MgO using an oxide interfacial layer for ultralow power SOT-MRAM cache memory, The 84th JSAP Autumn Meeting 2023, 2023, https://pub.confit.atlas.jp/ja/event/jsap2023a

H. HO*1, R. Zhang*1, T. Shirokura*1, S. Takahashi*2, Y. Hirayama*2, Nam Hai Pham*1, 1:Tokyo Institute of Technology, 2.Samsung Japan, Large spin Hall effect in BiSb topological insulator/CrOx/CoFeB/MgO with perpendicular magnetic anisotropy for ultralow power SOT-MRAM, International Conference on Applied and Engineering Physics (iCAEP-8), 2023, https://iop.vast.vn/icaep/2023/program_e.html

Tran Ngoc Vinh*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*2, Pham Nam Ha*1,1:Tokyo Institute of Tech., 2:Samsung Japan, BiSb/NiO/Co接合におけるスピンホール角のNiO膜厚依存性, The 69th JSAP Spring Meeting 2022 ,2022, https://confit.atlas.jp/guide/event/jsap2022s/subject/23p-E205-15/advanced

Shunsuke Yanai*1, Daiki Oshima*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*1, Takeshi Kato*2, 1:Nagoya Univ., 2:Samsung Japan, Spin orbit torques in ferrimagnetic Gd/FeCo multilayers, Japanese Journal of Applied Physics, 2022, https://doi.org/10.35848/1347-4065/ac8f52

Shunsuke Yanai*1, Daiki Oshima*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*1, Takeshi Kao*2, 1:Nagoya Univ., 2:Samsung Japan, Ta層上に積層した Gd / FeCo 多層膜 の スピン軌道トルク, The 46th Annual Conference on Magnetics in Japan, 2022, https://jglobal.jst.go.jp/detail?JGLOBAL_ID=202202275970768989

Shota Namba*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*2, Pham Nam Ha*1, 1:Tokyo Institute of Tech., 2:Samsung Japan, BiSbトポロジカル絶縁体/NiO/Co接合におけるNiO障壁高さの評価, The 83rd JSAP Autumn Meeting 2022, 2022, https://confit.atlas.jp/guide/event/jsap2022a/subject/23a-B201-9/advanced

Julian Sasaki*1, Shota Namba*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*2, Pham Nam Hai*1, 1:Tokyo Institute of Tech., 2:Samsung Japan, Highly efficient spin current source using BiSb topological insulator / NiO bilayers,Japanese Journal of Applied Physics, 2022, https://doi.org/10.35848/1347-4065/aca772

Julian Sasaki*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*2, Pham Nam Hai*1,1:Institute of Science Tokyo, 2:Samsung Japan, Highly efficient spin current source using BiSb topological insulator / NiO bilayers, The 82nd JSAP Autumn Meeting 2021, 2021、https://confit.atlas.jp/guide/event/jsap2021a/subject/11a-S302-8/advanced

Keisuke Masuda*1, Yoshiaki Sonobe*2, Hiroaki Sukegawa*1, Seiji Mitani*1, Yoshio Miura*1, 1:NIMS, 2:Samsung Japan, Interfacial giant tunnel magnetoresistance and bulk-induced large perpendicular magnetic anisotropy in (111)-oriented junctions with fcc ferromagnetic alloys: A first-principles study,Physical Review B, 2021,https://doi.org/10.1103/PhysRevB.103.064427

Syuta Honda*1, Yoshiaki Sonobe*2, Simon Greaves*1, 1:Kansai Univ., 2:Samsung Japan, Transforming Domain Motion for 3D Race Track Memory with perpendicular magnetic anisotropy, Journal of Physics D, 2021, https://doi.org/10.1088/1361-6463/abd060

Mingling Sun*1, Takahide Kubota*1, Keita Ito*1, Shigeki Takahashi*2, Yoshiyuki Hirayama*2, Yoshiaki Sonobe*2, Koki Takanashi*1,1:Tohoku Univ., 2:Samsung Japan, Epitaxially grown Cu2Sb-type MnGaGe films with large perpendicular magnetic anisotropy, Applied Physics Letters ,2020, https://doi.org/10.1063/1.5140398

W. Zhao*1, Takumi Kimura*1, Takeshi Kato*1, Daiki Oshima*1, Yoshiaki Sonobe*2, Shigeki Takahashi*2, Satoshi Iwata*1,1:Nagoya Univ.,2:Samsung Japan, Spin transfer torque switching of hybrid memory layers with low Curie temperature CoPd/Pd multilayers, Journal of Magnetism and Magnetic Materials, 2020, https://doi.org/10.1016/j.jmmm.2019.165749

W. Zhao*1, T. Kato*1, D. Oshima*1, Y. Sonobe*2, S. Takahashi*2, S. Iwata*1,1:Nagoya Univ., 2:Samsung Japan, Thermally assisted STT switching of hybrid memory layer using CoPd/Pd and Co/Pd multilayers, The 44th Annual Conference on Magnetics in Japan, 2020, https://magnetics.jp/kouenkai/2020/session/index_e.html

平岡紘次*1, 鈴木直毅*2, 鯉川舜*2, 東海旭宏*2, 関志朗*1, （1:工学院大学, 2:日本サムスン）, アノードレス型硫化物系Li全個体電池へのEx situ / Operandoラマン分校計測の適用及び負極反応の抽出, 電気化学会第91回大会, https://confit.atlas.jp/guide/event/ecsj2024s/top?lang=ja

Kaida T.*1, Ebisu S.*1, Baek J.*2, Hoshiba K.*2, Osawa T.*1, Noda Suguru*1, 1:Waseda U., 2:Samsung Japan, Coating of Carbon Nanotubes with Boron Nitride for Application to Lithium-Ion Batteries, SCEJ 89th Annual Meeting, https://www4.scej.org/meeting/89a/prog/en_progsearch.html?Item=All&Mode=AsIs&Pattern=kaida

M. A. Navarra*1, A. Tsurumaki*1, G. Maresca*1, N. Suzuki*2, Y. Aihara*2, (1:University of Rome, 2:Samsung Japan), Alloying composite anodes for all-solid-state lithium-ion batteries, https://projects.dii.unipd.it/beli24/wp-content/uploads/sites/10/2024/08/ShortScientificProgram_V2.pdf

守谷誠*1, 鯉川舜*2, 1:静岡大学, 2:日本サムスン, 分子結晶複合硫化物個体電解質を用いた全個体電池低拘束圧動作, 第65回 電池討論会, https://www.jtbwmice.jp/2024/denchi65/files/program.pdf

JEFFY*1, 町⽥信也*1, ⾦澤健⼈*2, 吉川⼤輔*2, (1:甲南⼤, 2:⽇本サムスン), Li7P3S(11-x)Ox結晶の合成とそのイオン伝導特性, 第50回固体イオニクス討論会, 日本固体イオニクス学会,2024, https://www.ssi-j.org/symp/ssij50/

M. A. Navarra *1, A. Tsurumaki*1, G. Maresca*1, M. Branchi, N. Suzuki*2, Y. Aihara*2,*1:Sapienza Universita di Roma, *2:Samsung Japan, COMPOSITE ANODES FOR ALL-SOLID-STATE LITHIUM-ION BATTERIES, Second Italian Workshop on Energy Storage, 2023, https://www.instm.it/eventi/second_italian_workshop_on_energy_storage_iwes_2023.aspx

Kim, J.-S.*1; Yoon, G.; Kim*1, S.; Sugata*2, S.; Yashiro, N.*2; Suzuki, S.*2; Lee, M.-J*1.; Kim, R.*1; Badding, M.*3; Song, Z.*3;*1:Samsung Electronics, *2:Samsung Japan,*3:Cornings, Surface Engineering of Inorganic Solid-State Electrolytes via Interlayers Strategy for Developing Long-Cycling Quasi-All-Solid-State Lithium Batteries. Nature Communications, 2023, 14. https://doi.org/10.1038/s41467-023-36401-7

N.Suzuki, N.Yashiro, R.Omoda,Samsung Japan, Highly Cyclable All-Solid-State Battery with Deposition-Type Lithium Metal Anode Based on Thin Carbon Black Layer, The 2023 MRS Spring Meeting & Exhibit, 2023, https://doi.org/10.1002/aesr.202100066

辻村知之*1, 伊藤清太郎*1, 吉田浩二*1, 東山有希*2, 相原雄一*1, 町田信也*2,Youngsin Park*3, Dongmin Im*3, 1:日本サムスン, 2:甲南大学, 3:Samsung Electronics, Synthesis and characterization of low temperature Li-ion conductive phase of LiX (X=Cl, Br)-Li3PS4 solid electrolyte,Journal of Power Sources, 2022, https://doi.org/10.1016/j.ssi.2022.115970

Maria Assunta Navarra*1, Akiko Tsurumaki*1, Giovanna Maresca*1, Naoki Suzuki*2, Yuichi Aihara*2,1:Sapienza Univ. of Rome, 2:Samsung Japan, Composite anodes for All-Solid-State Lithium-Ion Batteries, 46th International Conference and Expo on Advanced Ceramics and Composites (ICACC2022), 2022, https://ceramics.org/wp-content/uploads/2022/01/ICACC-Program-Guide-for-web.pdf

Mario Branchi*1, Giovanna Maresca*1, Akiko Tsurumaki*1, Naoki Suzuki*2, Fausto Croce*1, Stefania Panero*1, Jorunn Voje*1, Yuichi Aihara*2, Maria Assunta Navarra*1, 1:Sapienza Univ. of Rome, 2:Samsung Japan, Silicon-based composite anodes for all-solid-state lithium-ion batteries conceived by a mixture design approach, ChemSusChem, 2022, https://doi.org/10.1002/cssc.202202235

Naoki Suzuki, Nobuyoshi Yashiro, Satoshi Fujiki, Ryo Omoda, Tomoyuki Shiratsuchi, Taku Watanabe, Yuichi Aihara,Samsung Japan, Highly Cyclable All-Solid-State Battery with Deposition-Type Lithium Metal Anode Based on Thin Carbon Black Layer, Advanced Energy and Sustainability Research, 2021, https://doi.org/10.1002/aesr.202100066

Seyed Milad Hosseini*1, Alberto Varzi*1, Tomoyuki Tsujimura*2, Yuichi Aihara*2, Stefano Passerini*1, 1:Helmholtz Institute Ulm, 2:Samsung Japan, Liquid-assisted Mechanochemical Synthesis of LiI-doped Sulfide Glass Electrolyte, Energy Technology, 2021, https://doi.org/10.1002/ente.202100385

Akiko Tsurumaki*1, Giovanna Maresca*1, Naoki Suzuki*2, Koji Yoshida*2, Yuichi Aihara*2, Maria Assunta Navarra*1,1:Sapienza Univ of Rome, 2:Samsung Japan, Sn/C anode materials for all-solid-state lithium ion batteries with sulfide-based solid electrolytes; 72nd Annual ISE Meeting of the international society of electrochemistry, 2021, https://annual72.ise-online.org/

Akiko Tsurumaki*1, Giovanna Maresca*1, Naoki Suzuki*2, Koji Yoshida*2, Yuichi Aihara*2, Maria Assunta Navarra*1, ,1:Sapienza Univ of Rome, 2:Samsung Japan, Development of all-solid-state batteries with Sn/C composite anodes, First Italian Workshop on Energy Storage, 2021, https://www.instm.it/en/instm.aspx

Giovanna Maresca*1, Akiko Tsurumaki*1 , Naoki Suzuki*2, Koji Yoshida*2, Stefania Panero*1, Yuichi Aihara*2, MariaAssunta Navarra*1, 1:Sapienza Univ. of Rome, 2:Samsung Japan, Sn/C composite anodes for bulk-type all-solid-state batteries, Electrochimica Acta 395, 2021, 139104,2021, https://doi.org/10.1016/j.electacta.2021.139104

Yong-Gun Lee*1, Satoshi Fujiki*2, Changhoon Jung*1, Naoki Suzuki*2, Nobuyoshi Yashiro*2, Ryo Omoda*2, Dong-Su Ko*1, Tomoyuki Shiratsuchi*2, Toshinori Sugimoto*1, Saebom Ryu*1, Jun Hwan Ku*1, Taku Watanabe*2, Youngsin Park*1, Yuichi Aihara*2, Dongmin Im*1, In Taek Han*1,1:Samsung Electronics, 2:Samsung Japan, High-energy long-cycling all-solid-state lithium metal batteries enabled by silver–carbon composite anodes, Nature Energy, 2020, https://doi.org/10.1038/s41560-020-0575-z

Seyed Milad Hosseini*1, Alberto Varzi*1, Seitaro Ito*2, Yuichi Aihara*2, Stefano Passerini*1, 1:Helmholtz Institute Ulm, 2:Samsung Japan, High loading CuS-based cathodes for all-solid-state lithium sulfur batteries with enhanced volumetric capacity, Energy Storage Materials, 2020, https://doi.org/10.1016/j.ensm.2020.01.022

"F. Maroni*1, P. Bruni*2, N. Suzuki*3, Y. Aihara*3, S. Gabrielli*4, G. Carbonari*4, M. Agostini*5, M. Branchi*6, S. Ferrari*2, M. A. Navarra*6, S. Brutti*2, A. Matic*5, F. Nobili*4, F. Croce*1, 1:University of Chieti-Pescara, 2:Univ. of Chieti-Pescara, 3:Samsung Japan, 4:Univ. of Camerino, 5:Chalmers Univ. of Technology, 6:Università di Roma “La Sapienza”, 7: ,Highly Stable Fe3O4/C Composite: A Candidate Material for All Solid-State Lithium-Ion Batteries, Journal of The Electrochemical Society, 2020, https://doi.org/10.1149/1945-7111/ab80ce"

Ya-Qian Zhang*1, Yaosen Tian*1, Yihan Xiao*1, Lincoln J.*2 Miara, Yuichi Aihara*3, Tomoyuki Tsujimura*3, Tan Shi*1, M. C. Scott*1, Gerbrand Ceder*1, 1:University of California Berkeley, 2:Samsung Research America, 3:Samsung Japan, Direct Visualization of the Interfacial Degradation of Cathode Coatings in Solid State Batteries: A Combined Experimental and Computational Study,Advanced Energy Materials, 2020, https://doi.org/10.1002/aenm.201903778

M. Branchi*1, G. Maresca*1, Naoki Suzuki*2, Yuichi Aihara*2, Jorunn Voje*3, Maria Assunta Navarra*1, 1:Sapienza University of Roma, 2:Samsung Japan, 3:Elkem ASA, Optimization of silicon anode composition for all-solid-state lithium battery, Enerchem-2, 2020, https://enerchem-2.icmate.cnr.it/images/attachments/Book_2020_02_05_Enerchem2_final.pdf

Giovanna Maresca*1, Akiko Tsurumaki*1, Naoki Suzuki*2, Tomoyuki Tsujimura*2, Yuichi Aihara*2, Maria Assunta Navarra*1,1:Sapienza Univ of Rome, 2:Samsung Japan, Improvement of graphite interfacial stability in all-solid-state cells adopting sulphide glassy electrolytes, ChemElectroChem, 2020, https://doi.org/10.1002/celc.202001291

Hernandez, J. E.*1; Tanaka, N.*1; Yamada, R.*1; Wang, Y.*1; Nishihara, K.*1; Johzaki, T.*1; Sunahara, A.*1; Kang, K. S.; Ueyama, S.; Ozawa, K.; et al. Efficient Photo-Dissociation-Induced Production of Hydrogen Radicals Using Vacuum Ultraviolet Light from a Laser-Produced Plasma. Applied Physics Letters, 2024, 124. https://doi.org/10.1063/5.0186829.

Tanaka, N.*1; Zhu, B.*1; Liu, C.*1; Wang, Y.*1; Nishihara, K.*1; Hernandez, J. E.*1; Johzaki, T.*1; Sunahara, A.*1; Kang, K. S.*2; Ueyama, S.*3; K. Ozawa*3; S. Fujioka*1;1:Osaka Univ., 2:Samsung Ele., 3:Samsung Japan, Absolute Density Measurement of Hydrogen Radicals in XUV Induced Plasma for Tin Contamination Cleaning via Laser-Induced Fluorescence. Applied Physics Letters, 2024, 124. https://doi.org/10.1063/5.0189605

田中 のぞみ*1, Zhu Baojun1*1, Liu Chang*1 2, Wang Yubo*1, 西原 功修*13, Hernandez James Edward*1, 城崎知至*14, 砂原 淳*15, Kang Kyung Sik*6, , 上山 真司*7, 藤岡 慎介*1, 1.阪大レーザー研, 2.量研機構, 3.大阪公立大, 4.広大先進理工, 5.パデュー大, 6.Samsung MR, 7.日本サムスン, 極端紫外光誘起水素ラジカルの特性とスズ汚染洗浄に対する効果, 第71回応用物理学会春季大会, https://meeting.jsap.or.jp/archive/jsap2024s/wp-content/uploads/sites/17/2024/02/2024s_program.pdf

James Edward Hernandez1*1, Nozomi Tanaka*1, Yubo Wang*1, Katsunobu Nishihara*12, Kyung Sik Kang*3, Shinji Ueyama*4, Shinsuke Fujioka*1, 1:Osaka Univ., 2:Osaka Metro. Univ., 3:Samsung MR, 4:Samsung Japan, Characterization of a pulsed, high-pressure hydrogen gas source for H radical-based cleaning of extreme ultraviolet lithography mirrors, https://meeting.jsap.or.jp/archive/jsap2024s/wp-content/uploads/sites/17/2024/02/2024s_program.pdf

Sugiura Takamasa*1; Nagatomo Daisuke*1; Kajinami Masato*1;Ueyama Shinji*1;Tokumiya Takahiro*1; Oh Seungyeol*2; Ahn Sungmin*2; Choi Euisun*2; Woo Siwoong*2; Lee Hyunjin*2;Lee Byungjoon*2; Rhee, Minwoo Daniel*2, 1:Samsung Japan, Improved Edge Detection Algorithm for Blurred Alignment Marks in Hybrid Bonding, 26th Electronics Packaging Technology Conference (EPTC), 2024, https://www.eptc-ieee.net/uploads/exhibitors-pdf/67523ccd15c86_EPTC%20Final%20Program%20Finalized.pdf

N. Tanaka*1, J.E.Hernandez*1, Y.Wang*1, K.Nishihara*1*2, A.Sunahara*1*3,T.Johzaki*1*4, Kyung Sik Kang*5, S.Ueyama*6, S.Fujioka*1*7*1,1:Institute of Laser Engineering, Osaka University, 2:Osaka Metropolitan University, 3:Purdue University, 4:Hiroshima University, 5:Mechatronics Research, Samsung Electronics Co. Ltd., 6:Samsung Japan, 7:National Institute for Fusion Science, A Pathway to Tin Contamination Cleaning in Extreme Ultraviolet Lithography Source with Photoionized Plasma, 8th Asia-Pacific Conference on Plasma Physics, 3-8 Nov, 2024 at Malacca, https://www.aappsdpp.org/DPP2024/html/3contents/pdf/5208.pdf

James Edward Hernandez*1,Nozomi Tanaka*1,Yulin Gong*1,Yubo Wang*1,Ryuya Yamada*1,Katsunobu Nishihara*1*2,Atsushi Sunahara*1*3,Tomoyuki Johzaki*1*4,Kyung Sik Kang*5,Seungho Lee*5,Kyungbin Park*5,Shinji Ueyama*6,Shinsuke Fujioka*1, 1:Institute of Laser Engineering, Osaka University, 2:Osaka Metropolitan University, 3:Center for Materials Under eXtreme Environment,(CMUXE),Purdue University, 4:Graduate School of Advanced Science and Engineering, Hiroshima University, 5:Mechatronics Research, Samsung Electronics, 6:Samsung Japan, Utilization of soft x-ray emissions from nanosecond pulsed laser produced plasma for decontamination of reflective optics in extreme ultraviolet light lithography systems, 8th Asia-Pacific Conference on Plasma Physics, 3-8 Nov, 2024 at Malacca, https://www.aappsdpp.org/DPP2024/html/3contents/pdf/5296.pdf

Kenji Suzuki*1,Fumikazu Murakami*2,Inkeun Baek*3,Mitsunori Numata*1,Ingi Kim*3,Sungyoon Ryu*3,Shinji Ueyama*1,Myungjun Lee*3,Yusin Yang*3,Masayoshi Tonouchi*2, 1:Samsung Japan, 2 Osaka Univ.,3:Samsung Electronics,Precise non-contact measurement of p-n junction depth using terahertz emission spectroscopy,MNC2024, https://imnc.jp/2024/symp-a/

Kenji Suzuki*1,Fumikazu Murakami*2,Inkeun Baek*3,Mitsunori Numata*1,Ingi Kim*3,Ryu Sungyoon*3,Shinji Ueyama*1,Yusin Yang*3,Masayoshi Tonouchi*2, 1:Samsung Japan,2:Osaka Univ.,3:Samsung Electronics, Non-contact measurement of dopant depth profile with terahertz emission spectroscopy,SPIE Advanced Lithography + Patterning 2024, https://doi.org/10.1117/12.3010681

Nagatomo Daisuke*1; Sugiura Takamasa*1; Kajinami Masato*1;Ueyama, Shinji*1;Tokumiya Takahiro*1;Oh Seungyeol*2;Ahn Sungmin*2;Choi Euisun*2;Woo Siwoong*2;Lee Hyunjin*2;Lee Byungjoon*2;Rhee Minwoo Daniel*2,1:Samsung Japan, 2:Samsung Electronics, Alignment Vision System for Hybrid Bonding, 25th Electronics Packaging Technology Conference(EPTC2024), https://doi.org/10.1109/EPTC59621.2023.10457632

Sugiura, Takamasa*1; Nagatomo, Daisuke*1; Kajinami, Masato*1; Ueyama, Shinji*1; Tokumiya, Takahiro*1; Oh, Seungyeol*2; Ahn, Sungmin*2; Choi, Euisun*2; Woo, Siwoong*2; Lee, Hyunjin*2; Lee, Byungjoon*2; Rhee, Minwoo Daniel*2, 1:Samsung Japan, 2:Samsung Electronics, Edge Detection Algorithm for Blurred Alignment Marks in Hybrid Bonding, 2023 IEEE 25th Electronics Packaging Technology Conference (EPTC), https://doi.org/10.1109/EPTC59621.2023.10457741

J. E. Hernandez*1, N.Tanaka*1, Y.Wang*1, K.Nishihara*1, S.Fujioka*1, A.Sunahara*1,2, T.Johzaki*1,3, K.S.Kang*4, Y.Suh, J-G.Kim*4, S.Ueyama*5, K.Ozawa*5, 1:ILE, OSAKA Univ.、2:Purdue Univ.、3:Hiroshima Univ.、4:Samsung Electric, 5:Samsung Japan, Spectroscopic diagnostics of H-radicals formed by an extreme ultraviolet light source generated with a laser produced plasma, The Japan Society of Applied Physics, 2023, https://confit.atlas.jp/guide/event/jsap2023s/subject/17a-E502-4/detail?lang=en

N.Tanaka*1, Y.Wang*1, K.Nishihara*1, S.Fujioka*1, A.Sunahara*1,2, T.Johzaki*1,3, K.S.Kang*4, Y.Suh*4, J-G. Kim*4, S.Ueyama*5, K.Ozawa*5, 1:ILE Osaka Univ., 2:Purdue Univ, 3:Hiroshima Univ., 4:.Samsung Electric, 5:Samsung Japan, Comparison of focusing optics for extreme vacuum ultraviolet and vacuum ultraviolet emission from laser produced plasma, The Japan Society of Applied Physics, 2023, https://confit.atlas.jp/guide/event/jsap2023s/subject/17a-E502-5/tables?cryptoId=

Numata, M.*1; Kim, I.*2; Suzuki, K.*1; Ueyama, S.*1; Kim, J.*2; Kim, W.*2; Lee, M. *2, 1:Samsung Japan, 2:Samsung Electric, Magnetization property Inspection method for MRAM manufacturing,The Japan Society of Applied Physics, 2023, https://doi.org/10.1109/TMAG.2023.3289335

Sugiura, T.*1; Nagatomo, D.*1; Kajinami, M.*1; Ueyama, S.*1; Tokumiya, T.*1; Oh, S.; Ahn, S.; Choi, E.; Woo, S.; Lee, H.; *1:Samsung Japan, Edge Detection Algorithm for Blurred Alignment Marks in Hybrid Bonding. 2023 IEEE 25th Electronics Packaging Technology Conference (EPTC), 2023, 415–420. https://doi.org/10.1109/EPTC59621.2023.10457741.

Nagatomo, D.*1; Sugiura, T.*1; Kajinami, M.*1; Ueyama, S.*1; Tokumiya, T.*1; Oh, S.; Ahn, S.; Choi, E.; Woo, S.; Lee, H.; *1:Samsung Japan, Alignment Vision System for Hybrid Bonding. 2023 IEEE 25th Electronics Packaging Technology Conference (EPTC), 2023, 409–414. https://doi.org/10.1109/EPTC59621.2023.10457632.

J. E. Hernandez*1, N. T.*1,R. Yamada*1, Y. Wang*1, K. Nishihara*1, S. Fujioka*1, A. Sunahara*1,2, T. Johzaki*1,3, K. S. Kang*4, Y. Suh*4, J-G. Kim*4, S. Ueyama*5, Ken Ozawa*5, 1:ILE Osaka Univ., 2:Purdue Univ., 3:Hiroshima Univ., 4.Samsung El.Co.Ltd., 5.Samsung Japan, Emission spectroscopy of hydrogen plasma produced by extreme ultraviolet light for nanolithography application, The 84th JSAP Autumn Meeting 2023, 2023, https://pub.confit.atlas.jp/ja/event/jsap2023a/presentation/19a-A601-4

K. Ozawa*1 , K. Suzuki*1, S. Ueyama*1, J. Kim*2, W. Kim*2, I. Kim*2, 1:Samsung Japan, 2:Samsung Electronics, Novel magneto-optical Kerr effect measurement system for perpendicular magnetic anisotropy films for STT-MRAM, The 47th Annual Conference on MAGNETICS in Japan, 2023, https://www.magnetics.jp/kouenkai/2023/session/common/doc/program1_program_en.pdf

Numata, M.+1; Kim, I.*2; Suzuki, K.*1; Ueyama, S.*1; Kim, J.*2; Kim, W.*2; Lee, M.*2, 1:Samsung Japan, 2:Samsung Electronics, Scanning Magneto-Optic Kerr Effect Microscope for Inspection of MRAM Manufacturing. IEEE transactions on magnetics, 2023, 59, 1–5. https://doi.org/10.1109/TMAG.2023.3289335

Shinji Ueyama*1, Jinseob Kim*2, Mitsunori Numata*1, Wookrae Kim*2, Ingi Kim*2, Myungjun Lee*2, 1:Samsung Japan, 2:Samsung Electronics, High-speed wafer magnetic field inspection for semiconductor manufacturing, SPIE Advanced Lithography + Patterning 2022, 2022, https://doi.org/10.1117/12.2614750

Yasuhiro Hidaka*1, Jinyong Kim*2, Jaehwang Jung*2, Mitsunori Numata*1, Wookrae Kim*2, Ingi Kim*2, Shinji Ueyama*1, Myungjun Lee*2, 1:Samsung Japan, 2:Samsung Electronics, Sensitivity and repeatability performance on overlay and CD measurement by incorporating hologram based ellipsometry, SPIE Advanced Lithography + Patterning 2022, 2022, https://doi.org/10.1117/12.2614734

Chang Liu*1, Nozomi Tanaka*1, Baojun Zhu*1, Katsunobu Nishihara, Shinsuke Fujioka*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Ken Ozawa*3, Minoru Kubo*3, 1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Time resolved measurement of radical populations in an extreme ultraviolet light induced hydrogen plasma, Applied Physics Letters, 2022, https://doi.org/10.35848/1882-0786/ac4faa

Nozomi Tanaka*1, Yubo Wang*1, Katsunobu Nishihara*1, Shinsuke Fujioka*1, Atsushi Sunahara*1, Tomoyuki Johzaki*1, Youngduk Suh*2, Jeong-Gil Kim*2, Shinji Ueyama*3, Ken Ozawa*3, 1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Characteristics of the extreme ultraviolet spectrum from a laser produced plasma, The Japan Society of Applied Physics, 2022, https://confit.atlas.jp/guide/event/jsap2022a/subject/21p-C206-5/advanced

Yubo Wang*1, Nozomi Tanaka*1, Katsunobu Nishihara*1, Shinsuke Fujioka*1, Atsushi Sunahara*1, Tomoyuki Johzaki*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Shinji Ueyama*3, Ken Ozawa*3, 1: Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, A high-transmittance Schwarzschild objective (SO) to focus high-intensity EUV-VUV light from laser-plasma light source, The Japan Society of Applied Physics, 2022, https://confit.atlas.jp/guide/event/jsap2022a/subject/21p-C206-6/advanced

Jaehwang Jung*1, Wookrae Kim*1, Jinseob Kim*1, Seungwoo Lee*1, Inho Shin*1, Changhyeong Yoon*1, Seoyeon Jeong*1, Yasuhiro Hidaka*2, Mitsunori Numata*2, Shinji Ueyama*2, Changhoon Choi*1, Myungjun Lee*1, 1:Samsung Electronics, 2:Samsung Japan, Multi spectral holographic ellipsometry for a complex 3D nanostructure,Optics Express, 2022, https://doi.org/10.1364/OE.474640

小松 明浩*1, Kim JinSeob*2, 小澤 謙*1,1:日本サムスン, 2:Samsung Electronics 点回析干渉計による半導体検査装置のin-situ波面測定, 第46回 光学シンポジウム, 2021, https://myosj.or.jp/event2/opt_symp/2021_046th/46th_program.shtml

Nozomi Tanaka*1, Baojun Zhu*1, Chang Liu*1, Katsunobu Nishihara*1, Shinsuke Fujioka*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Ken Ozawa*3, Minoru Kubo*3,1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Cleaning of tin layer on EUV multilayer mirrors by the EUV induced hydrogen plasma,The 68th JSAP Spring Meeting 2021, 2021, https://confit.atlas.jp/guide/event/jsap2021s/subject/18a-Z14-2/advanced

Baojun Zhu*1, Chang Liu*1, Nozomi Tanaka*1, Katsunobu Nishihara*1, Shinsuke Fujioka*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Ken Ozawa*3, Minoru Kubo*3, 1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Two-photon laser-induced fluorescence of hydrogen atom in EUV photoionized plasma, The 68th JSAP Spring Meeting 2021, 2021, https://confit.atlas.jp/guide/event/jsap2021s/subject/18a-Z14-4/advanced

Chang Liu*1, Nozomi Tanaka*1, Baojun Zhu*1, Katsunobu Nishihara*1, Shinsuke Fujioka*1, Kyung Sik Kang*2, Youngduk Suh, Jeong-Gil Kim*2, Ken Ozawa*3, Minoru Kubo*3, 1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Optical Emission Spectroscopy (OES) measurement of EUV-induced plasma parameters in hydrogen, The 68th JSAP Sprng Meeting 2021, 2021, https://confit.atlas.jp/guide/event/jsap2021s/subject/18a-Z14-3/advanced

Chang Liu*1, Nozomi Tanaka*1, Baojun Zhu*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Ken Ozawa*3, Takeshi Takagi*3, Minoru Kubo*3, Shinsuke Fujioka*1,1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Spectroscopic diagnostics of hydrogen radicals in EUV induced hydrogen plasma, The 67th Japan Society of Application Physics Spring Meeting 2020, 2020, https://confit.atlas.jp/guide/event/jsap2020s/subject/14a-B508-10/advanced

Nozomi Tanaka*1, Baojun Zhu*1, Chang Liu*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Ken Ozawa*3, Takeshi Takagi*3, Minoru Kubo*3, Shinsuke Fujioka*1, 1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Cleaning of Sn layer in hydrogen plasma induced by intense pulsed EUV radiation, The 67th Japan Society of Application Physics Spring Meeting 2020, 2020, https://confit.atlas.jp/guide/event/jsap2020s/subject/14a-B508-9/advanced

Baojun Zhu*1, Chang Liu*1, Nozomi Tanaka*1, Kyung Sik Kang*2, Youngduk Suh*2, Jeong-Gil Kim*2, Ken Ozawa*3, Takeshi Takagi*3, Minoru Kubo*3, Shinsuke Fujioka*1, 1:Osaka Univ., 2:Samsung Electronics, 3:Samsung Japan, Two-photon laser-induced fluorescence of hydrogen atom in EUV photoionized plasma, The 67th Japan Society of Application Physics Spring Meeting 2020, 2020, https://confit.atlas.jp/guide/event/jsap2020s/subject/14a-B508-11/advanced

Ahn, C.*1; Yeom, K.*2; Schmidt, A.*2; Nishizawa, Y.*3; Payet, A.*3; Jin, S.*1; Kayama, Y.*3; Choi, W.*1; Kim, D. S.*2, 1:Samsung Semiconductor, 2:Samsung Electronics, 3:Samsung Japan, A Self-Consistent Tiling Method for Chip-Scale Stress Simulation. 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2024, 1–4., https://doi.org/10.1109/SISPAD62626.2024.10732995

Yeom, K.*1; Yoo, G.*1; Schmidt, A.*2; Payet, A.*2; Jeon, J.*1; Lee, S.*1; Nishizawa, Y.*2; Uchiyama, M.*2; Kayama, Y.*2; Ahn, C.*3; 1:Samsung Electronics, 2:Samsung Japan, 3:Samsung Semiconductor, Full Chip Stress Model for Defect Formation Risk Analysis in Multilayer Structures. 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), https://doi.org/10.1109/SISPAD62626.2024.10732998

Jung, J.*1; Yoo, G.*1; Schmidt, A.*1; Song, W.*1; Kubotera, H.*2; Raju, M.*2; Lee, B.*2; Choi, W.*2; Payet, A.*3; Koshimoto, H.*3; 1:Samsung Electronics, 2:Samsung Semiconductor, 3:Samsung Japan, Atomistic Multiscale Simulation-Based Extraction of Design Margins in Advanced Transistor Architectures. 2024 International Conference on Simulation of Semiconductor, https://doi.org/10.1109/SISPAD62626.2024.10733229

Song, Jiyong*1; Cheon, Wooyoung*1; Tsuji, Yukihide*1; Higuchi, Yuichiro*2; Kotakemori, Hisashi*2; Kim, Joo-Mi*1; Lee, Dong ryul*1; Lee, Shinwook*1; Kayama, Yasuyuki*2; Jeong, Jaehoon*1; Kim, Dae Sin*1; Lee, Sungho*1, 1:Samsung Electronics, 2:Samsung Japan,Wafer Edge and Backside Profile Integration with 3-D Process Emulation, 2024 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), https://doi.org/10.1109/SISPAD62626.2024.10733209

Bae, Jaehyun*1; Yoo, Gwangsu*1; Nakamura, Satoshi*2; Ohnishi, Shota*2; Kim, Dae Sin*1, 1:Saumsung Electronics, 2:Samsung Japan, Hardware efficient decomposition of the Laplace operator and its application to the Helmholtz and the Poisson equation on quantum computer, Quantum Information Processing, https://doi.org/10.1007/s11128-024-04458-y

櫻井 清吾, 日本サムスン, パルス変調プラズマエッチングにおけるグローバルモデルによる入射イオンエネルギー分布の予測, 化学工学会CVD反応分科会 第38回シンポジウム「半導体産業におけるプロセス開発の最新動向」, 2023, https://scej-cre.org/cre/cvd/report/report-symp38.html

Noaki, J.*1; Numazawa, S.*1; Jeon, J.*2; Kochi, S.*1, 1:Samsung Japan, 2:Samsung Electronics, Development of the Reactive Force Field and Silicon Dry/Wet Oxidation Process Modeling. npj Computational Materials, 2023, 9. https://doi.org/10.1038/s41524-023-01112-6.

Taiki Uemura*1, Byungjin Chung*2, Jegon Kim*2, Hyewon Shim*2, Shinyoung Chung*2, Brandon Lee*2, Jaehee Choi*2, Shota Ohnishi*1, Ken Machida*1, 1:Samsung Japan, 2:Samsung Electronics, Accelerator-Based Thermal-Neutron Beam by Compact and Low-Cost Moderator for Soft-Error Evaluation in Semiconductor Devices, IEEE International Reliability Physics Symposium (IRPS), 2022, https://doi.org/10.1109/IRPS48227.2022.9764438

Taiki Uemura*1, Byungjin Chung*2, Jegon Kim*2, Hyewon Shim*2, Shinyoung Chung*2, Brandon Lee*2, Jaehee Choi*2, Shota Ohnishi*1, Ken Machida*1, 1:Samsung Japan, 2:Samsung Electronics, Thermal-Neutron SER Mitigation by Cobalt-Contact in 7 nm Bulk-FinFET Technology, IEEE International Reliability Physics Symposium (IRPS), 2022, https://doi.org/10.1109/IRPS48227.2022.9764581

Fumie Machida*1, Hiroo Koshimoto*1, Yasuyuki Kayama*1, Alexander Schmidt*2, Satoru Yamada*1, Inkook Jang*2, Dae Sin Kim*2, 1:Samsung Japan, 2:Samsung Electronics, GPGPU MCII for high-energy implantation,SISPAD 2022, 2022, https://doi.org/10.1016/j.sse.2022.108520

Fumie Machida*1, Hiroo Koshimoto*1, Yasuyuki Kayama*1, Alexander Schmidt*2, Satoru Yamada*1, Inkook Jang*2, Dae Sin Kim*1, 1:Samsung Japan, 2:Samsung Electronics, GPGPU acceleration of Monte Carlo ion implantation for high-energy implantation, SDM (シリコン材料・デバイス研究会), 2022, https://ken.ieice.org/ken/paper/20221110nCnA/

Hiroo Koshimoto*1, Hisashi Ishimabushi*2, Jaehyun Yoo*2, Yasuyuki Kayama*2, Satoru Yamada*2, Uihui Kwon*1, Dae Sin Kim*1,1:Saumsung Electronics, 2:Samsung Japan, Gummel-cycle Algebraic Multigrid Preconditioning for Large-scale Device Simulations, SISPAD 2020, 2020, https://doi.org/10.23919/SISPAD49475.2020.9241643

Nakashima, K.*1; Takahama, H.*1; Yoshida, M.*2; Yamaguchi, K.*1; Hata, K.*2, 1:Ibaraki Univ., 2:Samsung Japan, Synthesis of BaTiO3–CaTiO3 and BaTiO3–SrTiO3 Core–Shell Nanocubes via the Surface Reconstruction of BaTiO3 Nanocubes. Inorganic chemistry, 2024, 63, 44–49. https://doi.org/10.1021/acs.inorgchem.3c02935.

大沼正人*1, Donghee Lee*1, 土井敏宏*2, (1北海道大学、2日本サムスン), 高エネルギーX線小角散乱法による粉末、ペースト、シート状MLCC用Ni微粒子のサイズ評価, 第 44 回電子材料研究討論会プログラム, 日本セラミックス協会電子材料部会, https://www.ceramic.or.jp/bdenshi/activity03/activity03_2024.html

土井敏宏*1、Lee Donghee*2、大沼正人2 (1日本サムスン、2北海道大学), Lab. scale U-SAXSによるMLCC用内部電極PasteにおけるNi粒子分散性の評価, 第 44 回電子材料研究討論会プログラム, 日本セラミックス協会電子材料部会, https://www.ceramic.or.jp/bdenshi/activity03/activity03_2024.html

石田瑞樹*1、長崎正雅*1、山口健*2、畠宏太郎*2、山田智明*1,3 (1名古屋大学、2日本サムスン株式会社、3東京科学大学元素戦略MDX研究センター), パイロクロア型酸化物Nd2Zr2O7への希土類イオンの添加による誘電率の向上化, 第 44 回電子材料研究討論会プログラム, 日本セラミックス協会電子材料部会, https://www.ceramic.or.jp/bdenshi/activity03/activity03_2024.html

Nakashima, K.*1; Toi, A.*1; Kuribara, R.*1; Yoshida, M.*1; Hasegawa, N.*1; Kobayashi, T.*1; Yamaguchi, K.*2; Hata, K.*2,1:Ibaraki Univ., 2:Samsung Japan, Temperature-Induced Lattice Defects and Surface Reconstruction in BaTiO3 Nanocubes. Chemistry of materials, 2024, 36, 8323–8329. https://doi.org/10.1021/acs.chemmater.4c01245.

Lee D.*1, Doi T.*2, Ohnuma M.*1, *1:Hokkaido Univ., *2:Samsung Japan, Characterization of Ni nano-particles by laboratory high energy ultra-small angle scattering, PRICM11(The 11th Pacific Rim International Conference on Advanced Materials and Processing) , 2023, https://pricm11.org/index.php